Spare Parts
  1. Accesories
  2. Generators
  3. MW Coupling
  4. Plasma indicators
  5. Vacuum pumps
  6. Cleaning sources
  7. Used Pumps and components
  8. Cleaning wipes

Accesories

Options and accesories for plasma systems

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

sample38

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

2.45GHz Generator (Microwave)

The power ranges from 0 to 850 watts, the generator has a PC interface. Main areas of application are activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end), plasma polymerization.

13.56 MHz generator

The power ranges from 0 to 850 watts, the generator has a PC interface. Main areas of application are activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end), plasma polymerization.

40 kHz generator

The power ranges from 0 to 850 watts, the generator has a PC interface. Main areas of application are activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end), plasma polymerization.

2/2 way valve for liquid dosage

Valve for the targeted dosage of monomers.

Activated carbon filter

The activated carbon filter can be easily changed.

Suction filter for vacuum

Protects the vacuum pump from projected parts, coating and contamination.

Automatic Door

A door that closes automatically at process start.

Barcode Reader

Protects the vacuum pump from projected parts, coating and contamination.

Heatable chamber

The chamber can be heated to approx. 80 C. The temperature can be regulated. It is for defined process conditions and higher etching rates.

Bias voltage measurement

Bias voltage measurement

The bias voltage measurement is a measurement device and is available for kHz and MHz generators.

Bubbler bottle

The bubbler bottle belongs to polymerization accessories and is required for the connection of liquid monomers to the vacuum chamber. A carrier gas is employed instead of the simple monomer bottle. The carrier gas, e.g. Argon, is flushed through the monomer.

Butterfly Valve

A butterfly valve is used for controlling a gas flow in vacuum technology, especially in the suction line of a vacuum pump. To this end, the flow resistance in the line is varied by adjusting a flap which can close the conduit to varying degrees.

Documentation in the national language

The documentation is created according to Machinery Directive 89/392/EEC. This does not apply for German and English languages. The documentation is not automatically included with the system and must be ordered separately.

Rotary drum

Product carrier for use with bulk materials.

Pressure gauges

Pirani sensor or Baratron - display of the pressure in the vacuum chamber.

Pressure reducer

The pressure reducer is to be connected to the gas bottle - 200 bar. Different gases need different pressure reducers. So there is one for noble gases H2, O2, CF4, C4F8 and one for NH3.

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Plasma Generators

For a plasma system to work, it needs a generator. Which frequency is best for the desired plasma treatment cannot be answered in general terms, but must be decided on a case by case basis. Diener has been offering plasma generators with a frequency of between 50 kHz and 2.45 GHz in its product range for many years, now 13.56 MHz generators have been specially developed and produced, which come with 100 and 300 watt versions.

1.RIE operation possible

2.Homogeneity is better than at 2.45 GHz

3.Etching rate is higher for the same power than at 40 kHz

4.Metal rotary drums can be easily used

5.Electrodes/product carriers can be constructed, but the balancing of the electrodes is very laborious

6.Good for front-end and back-end semiconductor processes

7.High deposition rates for plasma polymerization processes

Main applications areas for both powers are plasma applications for activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end) and plasma polymerization. Impedance matching can be achieved either manually (manual matching) or automatically (auto matching) and is necessary in all cases, which is why the HF system consists of a generator and matching.

During manual matching, the matching process must be set at each process start and checked and adjusted sporadically during the process; the capacitors are automatically adjusted and readjusted following changes.

In addition, it is also possible to display the forward and reverse power, safety shutdown via the door switch and vacuum safety switch, quartz-stabilized frequency to comply with EN 55011 and a PC interface.

2.45 GHz microwave coupling for plasma applications

Microwave coupling from Diener electronic

Please contact us for technical advice regarding this system:

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Plasma Generators

For a plasma system to work, it needs a generator. Which frequency is best for the desired plasma treatment cannot be answered in general terms, but must be decided on a case by case basis. Diener has been offering plasma generators with a frequency of between 50 kHz and 2.45 GHz in its product range for many years, now 13.56 MHz generators have been specially developed and produced, which come with 100 and 300 watt versions.

1.HF power range of up to 1250 watts depending on the magnetron used, which may be selected from a variety of available power classes (300 W, 850 W and 1200 W)

2.The intensity of the microwave plasma is continuously adjustable from the respective adjustable ignition point (minimum) to the upper power limit of the selected magnetron (max)

3.The emission duration is practically continuously variable, depending on the dimensions of the vacuum chamber

4.Preferable emitter diameter 8 mm for a glass body diameter of 32 mm

5.Installation of microwave coupling using KF40 welded vacuum small flange on the rear wall of the plasma chamber

6.Air cooling of the radiating element is possible

7.Design as a compact unit: Magnetron - waveguide - emitter

7.Power supply by means of a controllable brand name switching power supply

8.Mains voltage: 230 V +/- 10 % / 50 Hz

Main applications areas for both powers are plasma applications for activation, cleaning, etching, semiconductor (front-end), semiconductor (back-end) and plasma polymerization. Impedance matching can be achieved either manually (manual matching) or automatically (auto matching) and is necessary in all cases, which is why the HF system consists of a generator and matching.

During manual matching, the matching process must be set at each process start and checked and adjusted sporadically during the process; the capacitors are automatically adjusted and readjusted following changes.

In addition, it is also possible to display the forward and reverse power, safety shutdown via the door switch and vacuum safety switch, quartz-stabilized frequency to comply with EN 55011 and a PC interface.

Plasma indicators

2.45 GHz microwave coupling for plasma applications

Microwave coupling from Diener electronic

Please contact us for technical advice regarding this system:

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

What are plasma indicators?

Plasma indicators are simple and fast test methods for the detection of successful plasma processes.If component surfaces after plasma treatment do not demonstrate the desired properties, expensive complaints can quickly result. However, there are simple methods with which a successful plasma process can be detected, without great expenditure of time..

Why are they applied?

For process control of the following plasma processes: Cleaning-Activating-Etching

What types of indicator are there?

The plasma indicator-metal compound from Diener electronic offers users of plasma systems the possibility to see at a glance whether the applied plasma treatment has successfully occurred. The indicator consists of a liquid metal compound, which decomposes in the plasma. If a drop of this originally colorless liquid is applied on the component itself or a reference sample, it will transforms during the plasma treatment into a shiny metallic coating, which provides a clear contrast for most surfaces.

A liquid metal compound is used as the indicator, which decomposes in the plasma, leaving a shiny metallic coating on the treated surface.

Here the metal compound plasma indicator is applied to a polyamide surface: The image on the right shows the freshly applied drops of the solution and on the left the pure, gold-coloured metal after plasma treatment.

Vacuum pumps

Which vacuum pumps are most often used in plasma technology?

Vacuum pumps are used for generating a vacuum in the vacuum chamber of the plasma system.The most commonly used vacuum pumps in plasma technology are the following:

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

1. Rotary vane pumps

The rotary vane pump consists of a housing in which a rotor rotates eccentrically. In this housing, vanes are loaded by springs, which are pressed against, and slide along, the inner wall of the housing. The gas trapped on the suction side is compressed until it exceeds the ambient pressure and then the exhaust valve opens to the high-pressure side.

Functioning of the rotary vane pump

2. Oil-free pump for corrosive gas processes

Here we have had very good experience with so-called "dry screw vacuum pumps" from Busch (e.g. Model Cobra) and Edwards.

3. Roots vacuum pumps (Roots pumps)

The pressure which can be generated with a rotary vane pump is limited. To reinforce the suction we recommend combination with a roots vacuum pump. These form a so-called pump stand. A typical combination is made up as follows:

Schematic cross-section of a roots vacuum pump

Functional diagram of a roots vacuum pump

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning sources

Plasma cleaning sources from Diener electronic

The plasma cleaning source is an optional exhaust gas purification for dry running vacuum pumps such as roots or screw pumps. For different plasma systems there are matching dry running vacuum pumps such as roots or screw pumps to perform the corresponding plasma process. In practice these pumps become contaminated during use with a plasma by fluid residues and so the vacuum pump has limited functionality. The plasma cleaning source, developed and produced by Diener electronic, and patent-pending, offers protection for these vacuum pumps and cleans the hollow spaces.The plasma cleaning source essentially consists of a process gas injection and removal from the hollow space and an electrode in, or on, the hollow space for generating plasma. Debris in the hollow spaces can be avoided or removed at any time. A longer life of the vacuum pump is therefore ensured.

Used Pumps and components

We also sell used vacuum pumps. Prices are dependent on condition. For more information, please call for details.

Give us a call and we will be happy to advise you. Phone: + 49 (0) 74 58 - 999 31-0.

sample38

Helmet

Treatment:

-Plasma Cleaning / Activation:removal silicon residues Preparation before gluing/painting

Next Processes:

Gluing / Painting

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

Cleaning:Example Cleaning

Activation:Example Activation

NEW: Plasma Cleaning wipes